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Diffractive Optical Elements take advantage of an array of nano structures on the material surface, to reshape the light that is being transmitted. This allows DOEs to pose a significant advantage as they are able to fulfil key operations that would otherwise require complex optical systems or arrays.
At Enlitho, we use our proprietary algorithm to deconstruct patterns into nano-structures that we are able to pattern using our high precision tools.
We also use our multiphysics simulation software to conduct design testing and evaluate the performance of the components.
Pattern Area: Up to 20 mm pattern area on 25 mm square substrate substrate (upgradable upon request)
Resolution: ≥ 50 nm
Thicknesses: ≥ 500 um
Sidewall Profile: ~ 90 degrees
Diffractive Optical Elements take advantage of an array of nano structures on the material surface, to reshape the light that is being transmitted. This allows DOEs to pose a significant advantage as they are able to fulfil key operations that would otherwise require complex optical systems or arrays.
Rare Earth Upconversion nanoparticles (UCNPs) utilise two-photon excitation which emits higher-energy photons by absorbing two or more low energy photons. Depending on the dopants of choice, UCNPs exhibit characteristic emission peaks at wavelengths ranging from ultraviolet (UV), visible light or near-infrared (NIR) illuminescence upon excitation at 975 nm.
Customization of these particles can cater for a variety of applications such as two-photon excitation microscopy, luminescent biological labeling or as spectral converters to increasing solar cell efficiency.
Particle Size: ~30nm
Excitation λmax: 980nm NIR
Emission λmax: 540nm, 655nm
Supplied in cyclohexane or other organic solvent
Rare Earth Upconversion nanoparticles (UCNPs) utilise two-photon excitation which emits higher-energy photons by absorbing two or more low energy photons. Depending on the dopants of choice, UCNPs exhibit characteristic emission peaks at wavelengths ranging from ultraviolet (UV), visible light or near-infrared (NIR) illuminescence upon excitation at 975 nm.
Customized thin-film coating from UV 200nm until NIR 2,800nm for T, R & Absorption control on various optical grade Substrates & Polymer.
Our Capabilities for Coating covers all types: Anti Reflection, Beam Splitters, Filters, Mirrors in a wide variety of spectrum according to your application.
Combined with our other in-house capability such as Dicing, Painting, Hard Coat, Bonding, & Assembly we can provide a fuller package to your optical components.
Customized thin-film coating from UV 200nm until NIR 2,800nm for T, R & Absorption control on various optical grade Substrates & Polymer. Our Capabilities for Coating covers all types: Anti Reflection, Beam Splitters, Filters, Mirrors in a wide variety of spectrum according to your application.
Utilising multiphysics simulation software, we conduct design testing and validation across various technology application areas such as fluid flow, mold design, microlens design, diffractive optics, and plasmonics.
Through design and simulation, we enable our customers to achieve a higher degree of success for device design with significantly accelerated prototyping phases.
Utilising multiphysics simulation software to conduct design testing and validation across various technology application areas such as fluid flow, mold design, microlens design, diffractive optics and plasmonics.
Our micro-nano fabrication services are carried out in a class 1K cleanroom to ensure high quality and reliability when it comes to device fabrication. We utilise various state-of-the-art micro-nanofabrication tools and systems such e-beam lithography and nanoscribe that allows 2D, 2.5D and 3D micro-nanopatterning up to a 50nm resolution with in-house processes.
Beyond design capabilities, we also support our customers in process development, providing our expertise and know-how in cost-effective and fast turn-around fabrication.
≥ 800nm; frontside alignment< 1um ≥1um< 1um≥200nm 
≥ 50nm ≥ 200nm 
Lithography using state-of-the-art nanopatterning systems for 2D/2.5D/3D.
Our master mold fabrication services are carried out in a class 1K cleanroom to ensure high quality and reliability. We utilise various state-of-the-art micro-nanofabrication tools and systems, combined with our proprietary in-house processes to give precision components on a variety of substrates.
We are able to fabricate master molds with the necessary polarity and resolution on materials like Glass, Silicon, Quartz, & Nickel. Master mold material can be chosen to meet specific mechanical, optical, or semi-conductor properties.
With our expertise, we guide our customers and help make inform decisions on choosing the right kind of master mold to meet their needs. Certain molds are well suited for early-stage design to mid stage prototyping applications to help accelerate proof of concept testing and evaluation.
Upon successful prototyping phase, we are able to manufacture specialised, durable Nickel molds to meet your high throughput manufacturing & replication needs. We also provide our technology translation and commercialisation platform known as Enhanced Molding Technology (EMT) that provides cost-effective scaling and manufacturing of precision devices.
Pattern Area: Up to 6” diameter wafers or 5” x 5” square substrate (upgradable upon request)
Resolution: ≥ 150 nm
Thicknesses: from 500nm to 500um
Alignment:Support multiple layers with < 1um alignment accuracy
Sidewall Profile: ~ 90 degrees
Proprietary master mold design and fab capabilities in silicon, glass or other materials to support mass production micro-injection molding and nanoimprint lithography process.
Our nanoimprint lithography service allows for fabrication of high resolution structures on a variety of surfaces & materials.
Mechanical deformation of the resist or material surface allows for a lower cost, high throughout fabrication method, that is extremely well suited for smaller sized components.
Enlitho offers both planar and roll-to-roll UV nanoimprint lithography services to better cater to customer demands.
Pattern Area: Up to 6” diameter wafers
Resolution: ≥ 50 nm
Material: Typical imprint substrates include Silicon, Glass, and various polymer sheets like PC, PET, PTFE etc
Pattern Area: Up to 30cm width (upgradable upon request)
Resolution: ≥ 50 nm
Throughput: 20 meter / minute
Material: Typical imprint substrates include Silicon, Glass, and various polymer sheets like PC, PET, PTFE etc
Nanofabrication processes via e-beam lithography and dry/wet-etching techniques.